Dr. Singh received his doctorate degree in solid-state physics and thin film technology from the Indian Institute of Technology (Delhi India) in 1980. In 1981-1984, he conducted post-doctorate research on sub-100nm lithography using E-beam and X-ray lithography at the Glasgow University (Scotland) and at Moore School of electrical Engineering, University of Pennsylvania (Philadelphia).

A 23-year Advanced Micro Devices veteran (1984-2007), Dr. Singh led the team coordinating metrology roadmap; advanced lithography and next generation design based metrology for process monitoring and control. He has more than 60 publications and more than 200 patents to his credit in the areas of lithography, metrology and semiconductor material.

Dr. Singh is involved in SPIE Conference as Session Chair since 1990, he was Conference chairman in 1998-1999 ( Metrology, Inspection and Process Control for Microlithography, San Jose) and Conference Chairman “Advanced Characterization Techniques for optics, semiconductors and nanotechnologies”, San Diego, CA (1998- Current)

He was elected to the prestigious position of Fellow of the International Society for Optical Engineering (SPIE) in 2003 for his numerous innovative contributions to the semiconductor industry in the area of Microlithography and Metrology. He is also the Associate Editor for the SPIE Journal of Microlithography, Microfabrication and Microsystems (JM3). He was keynote speakers in several National and International conference/Seminars.